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Tin sulfide Topography FrictionalForce MeltingPoint Polymer Tapping MonoLayer Aggregated_molecules molecules SolarCell NUS_NNI_Nanocore GaN Pores Cancer Composition cannabidiol LifeScience Defect NTU Gong PVAC SiliconOxide ito_film 3-hexylthiophene Polystyrene Leakage Lateral Writing Electical&Electronics Ni-FeAlloy Ni81Fe19 LightEmiting FrictionalForceMicroscopy Vanadate CaMnO3
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ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256