-
CompactDisk Etch HafniumDioxide Titanate MfmPhase HardDisk nanobar Multiferroic_materials Polyurethane Zagreb Fet FastScan NCM TCS Memory Hexylthiophene Defect INSPParis heterojunctions IVSpectroscopy Ca10(PO4)6(OH)2 YttriaStabilizedZirconia Water Temperature Boron Alkane Polypropylene Treatment Tapping SKPM Alloy I-VSpectroscopy Tin disulfide Cobalt-dopedIronOxide TransitionMetal
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Lithography on Si substrate
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: ContscPt (k=0.2N/m, f=25kHz)
- Scan Size: 10μm×10μm
- Scan Rate: 1Hz
- Pixel: 1024×512
- Litho. mode: Tip bias mode
- Litho. Tip bias: Black -10V, White 0V