-
tip_bias_mode Thermoplastic_polyurethane Fujian ReflexLens Self-assembledMonolayer Metal Change bias_mode domain_switching NCM CBD Hydroxyapatite Pvdf ImideMonomer Co/Cr/Pt Array KelvinProbeForceMicroscopy University_of_Regensburg Morphology Tungsten Inorganic_Compound ThermalProperties NusEce ito_film I-VSpectroscopy HafniumDioxide Electronics Cross-section Biofilm TungstenThinFilmDeposition Lattice Phthalocyanine Imprint plastics PhaseTransition
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256