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Inorganic OxideLayer hard_disk dielectric trench BiFeO3 Nanofiber Wonseok Photovoltaics ElectroChemical semifluorinated_alkane BlockCopolymer Holes DiffractiveOpticalElements Layer pulsed_laser_deposition F14H20 Granada PinpointNanomechanicalMode TungstenThinFilmDeposition membrane HexagonalBoronNitride PVAC Ram EFMAmplitude Steps nanobar lithography MfmPhase silicon_oxide LightEmission Aggregated_molecules Floppy CeramicCapacitor C_AFM PS_PVAC
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2L-MoS₂ (1/3)
Scanning Conditions
- System : FX40
- Sample bias: 0.25 V
- Scan Mode: C-AFM, LFM
- Scan Rate : 4 Hz
- Scan Size : 2.5μm×2.5μm
- Pixel Size : 512×512
- Cantilever : ContSCPt (k=0.2N/m, f=25kHz)